Plasma Sources for Thin Film Deposition and Etching: Volume 18
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Plasma Sources for Thin Film Deposition and Etching: Volume 18

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Description

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.
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Product details

  • Hardback | 328 pages
  • 157.5 x 233.7 x 27.9mm | 703.08g
  • Academic Press Inc
  • San Diego, United States
  • English
  • 0125330189
  • 9780125330183

Table of contents

Design of High- Density Plasma Sources for Materials Processing M.A. Lieberman and R.A. Gottscho Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films O.A. Popov Unbalanced Magnetron Sputtering S.L. Rohde The Formation of Particles in Thin-Film Processing Plasmas Steinbruchel
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