Photochemical Processing of Electronic Materials
This is a publication reflecting the current state of photoprocessing which offers an introduction to the field, an assessment of potential future applications of the technique and a discussion of problems that have yet to be solved. The book is designed to be of interest to applied research scientists as well as to students and engineers in the field and those in managerial or funding positions.
- Hardback | 548 pages
- 152 x 229mm | 971g
- 01 Nov 1991
- Elsevier Science Publishing Co Inc
- Academic Press Inc
- San Diego, United States
Table of contents
Photochemical Processing: Fundamental Mechanisms and Operating Criteria. Developments in Excimer Lasers for Photochemical Processing. Deep UV Optics for Excimer Lasers. Sub-Micron Lithography for Semiconductor Device Ravrication. Promoting Photonucleation on Semiconductor Substrates for Metallization. Considerations of the Microscopic Basis for Photo-Enhanced Chemical Beam Epitaxy. Photo-Assisted II-VI Epitaxial Growth. IR and UV Photo-Assisted Formation of Silicon Dioxide. Gas Immersion Laser Doping (GLD) in Silcon. Photochemical Etching of III-V Semiconductors. Excimer Laser Chemical Etching Fo Silicon and Copper. Laser Ablation of Polymers. Laser Ablation of Superconductors. Fast In-Situ Metallisation: A Comparison of Several Methods with Possible Applications in High Density Multichip Interconnects. Laser Asisted Fabrication of Integrated Circuits in Gallium Arsenide. Photon Probes for In-Process Control During Semiconductor Fabrication. Index.