Photochemical Processing of Electronic Materials

Photochemical Processing of Electronic Materials

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Description

This is a publication reflecting the current state of photoprocessing which offers an introduction to the field, an assessment of potential future applications of the technique and a discussion of problems that have yet to be solved. The book is designed to be of interest to applied research scientists as well as to students and engineers in the field and those in managerial or funding positions.
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Product details

  • Hardback | 548 pages
  • 152 x 229mm | 971g
  • Academic Press Inc
  • San Diego, United States
  • English
  • 012121740X
  • 9780121217402

Table of contents

Photochemical Processing: Fundamental Mechanisms and Operating Criteria. Developments in Excimer Lasers for Photochemical Processing. Deep UV Optics for Excimer Lasers. Sub-Micron Lithography for Semiconductor Device Ravrication. Promoting Photonucleation on Semiconductor Substrates for Metallization. Considerations of the Microscopic Basis for Photo-Enhanced Chemical Beam Epitaxy. Photo-Assisted II-VI Epitaxial Growth. IR and UV Photo-Assisted Formation of Silicon Dioxide. Gas Immersion Laser Doping (GLD) in Silcon. Photochemical Etching of III-V Semiconductors. Excimer Laser Chemical Etching Fo Silicon and Copper. Laser Ablation of Polymers. Laser Ablation of Superconductors. Fast In-Situ Metallisation: A Comparison of Several Methods with Possible Applications in High Density Multichip Interconnects. Laser Asisted Fabrication of Integrated Circuits in Gallium Arsenide. Photon Probes for In-Process Control During Semiconductor Fabrication. Index.
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