Fabrication Engineering at the Micro and Nanoscale
Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, the third edition of Fabrication Engineering at the Micro and Nanoscale provides a thorough and accessible introduction to all fields of micro and nano fabrication. Completely revised and updated, the text covers the entire basic unit processes used to fabricate integrated circuits and other devices. It includes more worked examples, illustrations, and expands coverage of the frontiers of fabrication processes. The physics and chemistry of each process are introduced along with descriptions of the equipment used to carry out the processes. The text uses a popular commercial process simulation suite-the Silvaco Athena(R) set of codes-to provide meaningful examples of many of the basic processes including diffusion, oxidation, lithography, and deposition. The book goes on to discuss the integration of these basic unit processes into various technologies, concentrating on CMOS transistors. The text breaks down the material into treatments on the concepts of process modules, thermal budget, advanced architectures, and the use of channel strain for improved performance.
- Paperback | 672 pages
- 190.5 x 233.68 x 25.4mm | 975.22g
- 10 Jan 2008
- Oxford University Press Inc
- New York, United States
- 3rd Revised edition
- 49 halftones, 410 line illus.
About Stephen A. Campbell
Stephen A. Campbell is Professor of Electrical and Computer Engineering at the University of Minnesota, Distinguished Professor of the Institute of Technology, Director of the Nanofabrication Center, and Director of the Center for Nanostructure Applications. He has extensive experience in both academia and industry in microelectronic processing. His current research interests include the application of semiconductor nanoparticles for high performance electronic and optoelectronic devices, advanced materials, novel sensors and transistor structures, and various applications of MEMS.
Table of contents
1. An Introduction to Microelectronic Fabrication ; 2. Semiconductor Substrates ; 3. Diffusion ; 4. Thermal Oxidation ; 5. Ion Implantation ; 6. Rapid Thermal Processing ; 7. Optical Lithography ; 8. Photoresists ; 9. Nonoptical Lithographic Techniques ; 10. Vacuum Science and Plasmas ; 11 . Etching ; 12. Physical Deposition: Evaporation and Sputtering ; 13. Chemical Vapor Deposition ; 14. Epitaxial Growth ; 15. Device Isolation, Contacts, and Metallization ; 16. CMOS Technologies ; 17. Other Transistor Technologies ; 18. Optoelectronic Technologies ; 19. MEMS. ; 20. Integrated Circuit Manufacturing ; Acronyms and Common Symbols ; Properties of Selected Semiconductor Materials ; Physical Constants ; Conversion Factors ; Some properties of the Error Function ; F Values ; Index