Diamond Thin Films

Diamond Thin Films

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An understanding of thin-film diamond by physical and chemical vapour deposition CVD is of wide application in materials science. This book provides an account of the physical, mechanical and chemical properties of diamond thin films as well as examining the engineering techniques and problems required to exploit them successfully. "Diamond Thin Films" explores the application and measurement of CVD in existing applications and their potential for new usage. The properties of diamond and the techniques of synthesis are examined in detail, with particular emphasis on diamond growth by CVD and quality, shaping and reaction factors. The areas for future study and application are discussed in terms of current state-of-the-art materials and surface science. This book should be a valuable resource for materials scientists and physicists involved in the study of semi-conductor materials, thin films and surface science.
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Product details

  • Hardback | 250 pages
  • 216 x 279mm | 453g
  • CRC Press
  • London, United Kingdom
  • English
  • 0748406360
  • 9780748406364

Table of contents

I. Applications of Diamond and Diamond Thin-films: Size, Cost and Purity Limitations of Natural and Synthetic Sources, Leading to New Uses for CVD Diamond II. Properties of Single Crystal Diamond and Polycrystalliine Films: Mechanical, Thermal, Chemical, Optical, Electrical; Particular Features of Thin Metal Films Including Stress and Intergranular Material; Surfaces and Hydrogen Bonding III. Assessment of Thin-film Diamond Quality; Thermal and Electrical Conductivity, Purity, Measurement of SP^O2 :SP^O3 Bondong Proportions (eg XPS and Raman Scattering), IR Spectroscopy, Luminescence, Electron Microscopy IV. Diamond Synthesis I: Introduce by Conversion of Graphite, Metastability of Diamond at Room Temperature; History of Attempts to Synthesise Diamond V. Diamond Synthesis II: (Thermal) Chemical Vapour Techniques; Plasma Chemical Vapour Technique; Composition/Phase Diagram VI. In Situ Monitoring of Growth and Equipment Design for Plasma CVD VII. Thermodynamics and Kinetics of Diamond Growth by CVD; Deposition Rate Compared with Film Quality VIII. Surface Reactions and CVD Growth Mechanism; Computer Studies VIIII. Epitaxial Growth, Doping and Prospects for Diamond Electronics X. Diamond Surface Shaping: Etching and Polishing by Chemical, Plasma and Laser Interactions XI. Summary and Conclusions
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About John I. B. Wilson

Heriot-Watt University, Edinburgh, Scotland Heriot Watt University, UK
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