Developments in Surface Contamination and Cleaning - Vol 8: Cleaning Techniques
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Developments in Surface Contamination and Cleaning - Vol 8: Cleaning Techniques

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Description

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader.
Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.
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Product details

  • Paperback | 234 pages
  • 152.4 x 228.6mm
  • Norwich, United States
  • English
  • 0128103388
  • 9780128103388

Table of contents

1 Cleaning for Removal of Post Chemical Mechanical Planarization Residue (Manish Keswani) 2 Liquid Displacement Drying Techniques (Ian Parry) 3 UV Ozone Cleaning (Rajiv Kohli) 4 Carbon Dioxide Dry Ice Spray Cleaning (Simon Motschmann) 5 Use of Water Ice Pellets for Removal of Surface Contaminants (Rajiv Kohli) 6 Advanced Cleaning Processes in Semiconductor Manufacturing (Mahmood Toofan) 7 Precision Cleaning of Electronic Assemblies (Helmut Schweigert)
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Review quote

..".this excellent series continues to report new cleaning processes in a critical light as well as procedures and protocols for assessing cleanliness...I'm not aware of any comparable in-depth treatments in the field of industrial cleaning and for that reason alone, strongly recommend these volumes or individual chapters within them." --Galvanotechnik
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About Rajiv Kohli

NASA Johnson Space Center -Rajiv Kohli is a leading expert in contaminant particle behaviour, surface cleaning and contamination control. At the NASA Johnson Space Center he has primary responsibility for contamination control related to spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program (designed to meet the United States Vision for Space Exploration). He helped to develop solvent-based cleaning applications for the nuclear industry and an innovative microabrasive system for a wide variety of applications in the commercial sector. He co-authored Commercial Utilization of Space: An International Comparison of Framework Conditions, and has published over 200 technical papers. His other specialisms include precision cleaning, solution and surface chemistry, advance materials and chemical thermodynamics. In 2005, Dr. Kohli received the Public Service Medal, one of NASA's highest awards, for contributions to the Space Shuttle Return to Flight project. Editor: 'Reviews of Adhesion and Adhesives' was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of adhesion science and technology and in surface contamination and cleaning. He is the founding editor of the Journal of Adhesion Science and Technology and is editor of 85 books, many of them dealing with surface contamination and cleaning. In 2002, the Kash Mittal Award was inaugurated for his extensive efforts and significant contributions to the field of colloid and interface chemistry. Among his numerous awards, Dr. Mittal was awarded the title honoris causa by the Maria Curie-Sklodowska University in Lubin, Poland in 2003.
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