Chemical Vapor Deposition

Chemical Vapor Deposition : Principles and Applications

Edited by  , Edited by  , Edited by 

Free delivery worldwide

Available. Dispatched from the UK in 1 business day
When will my order arrive?

Description

This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
show more

Product details

  • Hardback | 677 pages
  • 157.48 x 236.22 x 45.72mm | 1,065.94g
  • Academic Press Inc
  • San Diego, United States
  • English
  • 0123496705
  • 9780123496706

Table of contents

M.L. Hitchman and K.F. Jensen, Chemical Vapour Deposition--An Overview. K.F. Jensen, Fundamentals of Chemical Vapour Deposition. W.G. Breiland and P. Ho, Analysis of Chemical Vapor Deposition Processes. M.L. Hitchman and K.F. Jensen, Chemical Vapor Deposition at Low Pressures. B.S. Meyerson, Silicon Epitaxy by Chemical Vapor Deposition. R.L. Moon and Y.-M. Houng, Organometallic Vapor Phase Epitaxy of III-V Materials. D.W. Hess and D.B. Graves, Plasma-Assisted Chemical and Vapor Deposition. V.R. McCrary and V.M. Donnelly, Photo-Assisted Chemical Vapor Deposition. W.B. Jackson, Electronic and Optical Characterization of Chemical Vapor Deposition Films for Device Applications. G. Wahl, Protective Coatings. Index.
show more