Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment: Proceedings of the International Symposium

Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment: Proceedings of the International Symposium

Hardback

Edited by Evgeni P. Gusev, Edited by Lih-Juann Chen, Edited by Hiroshi Iwai, Edited by Dim-Lee Kwong, Edited by Mehmet C. Ozturk, Edited by Fred Roozeboom, Edited by Paul J. Timans

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  • Publisher: Electrochemical Society
  • Format: Hardback | 634 pages
  • Dimensions: 152mm x 229mm x 32mm | 907g
  • Publication date: 31 December 2005
  • ISBN 10: 1566774632
  • ISBN 13: 9781566774635

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