Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS

Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS : New Materials, Processes, and Equipment: Proceedings of the International Symposium

Edited by Evgeni P. Gusev , Edited by Lih-Juann Chen , Edited by Hiroshi Iwai , Edited by Dim-Lee Kwong , Edited by Mehmet C. Ozturk , Edited by Fred Roozeboom , Edited by Paul J. Timans

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  • Hardback | 634 pages
  • 152.4 x 228.6 x 31.75mm | 907.18g
  • 01 Dec 2005
  • Electrochemical Society
  • English
  • 1566774632
  • 9781566774635

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