Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS

Advanced Gate Stack, Source/Drain and Channel Engineering for Si-Based CMOS : New Materials, Processes, and Equipment: Proceedings of the International Symposium

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Product details

  • Hardback | 634 pages
  • 152.4 x 228.6 x 31.75mm | 907.18g
  • Electrochemical Society
  • United States
  • English
  • 1566774632
  • 9781566774635